Description
Titanium Sputtering Target — Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, titanium is lustrous and silvery-white in appearance. It has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor pressure of 10⁻⁴ Torr at 1,453°C. It is a sturdy material that can be easily fabricated when heated.
With strong, lightweight characteristics and excellent corrosion resistance, titanium is ideal for ocean liner hulls, aircraft engines, and designer jewelry. As a biocompatible material, it is widely used in surgical tools and medical implants.
Titanium Sputtering Targets are generally evaporated in a vacuum and deposited as coatings for wear resistance, decorative, semiconductor, and optical applications.
Titanium Sputtering Targets (Ti Target)
Material: High purity (99.5%, 99.995%) Titanium Sputtering Target
Grade: Gr1, Gr2, Gr5/Ti6Al4V, Gr7 Titanium Sputtering Target
Standard: ASTM B381, ASTM B265, ASTM F67, ASTM F136
Shape: Discs, Rectangles, Custom Shapes Available
Application: Deposited film nitride as decorative thin film; deposited film oxidized to TiO₂ as beam splitter or insulator
Physical Properties
| Grade |
Tensile Strength (MPa-Min) |
Yield Strength (MPa-Min) |
Elongation (%) |
| Gr1 |
240 |
170 |
24 |
| Gr2 |
345 |
275 |
20 |
| Gr3 |
450 |
380 |
18 |
| Gr4 |
550 |
483 |
15 |
| Gr5 |
895 |
828 |
10 |
| Gr7 |
400 |
275 |
18 |
| Gr9 |
620 |
483 |
15 |
| Gr12 |
483 |
348 |
18 |
| Gr23/Gr5-Eli |
793 |
759 |
10 |
Chemical Composition
| Grade |
Fe Max |
O Max |
N Max |
C Max |
H Max |
Pd Max |
Al Max |
Va Max |
Ni Max |
Mo Max |
| Gr1 |
0.2 |
0.18 |
0.03 |
0.08 |
0.015 |
- |
- |
- |
- |
- |
| Gr2 |
0.3 |
0.25 |
0.03 |
0.08 |
0.015 |
- |
- |
- |
- |
- |
| Gr3 |
0.3 |
0.35 |
0.05 |
0.08 |
0.015 |
- |
- |
- |
- |
- |
| Gr4 |
0.5 |
0.4 |
0.05 |
0.08 |
0.015 |
- |
- |
- |
- |
- |
| Gr5 |
0.4 |
0.2 |
0.05 |
0.08 |
0.015 |
- |
5.5–6.7 |
3.5–4.5 |
- |
- |
| Gr7 |
0.3 |
0.25 |
0.03 |
0.08 |
0.015 |
0.12–0.25 |
- |
- |
- |
- |
| Gr9 |
0.25 |
0.15 |
0.03 |
0.08 |
0.015 |
- |
2.5–3.5 |
2.0–3.0 |
- |
- |
| Gr12 |
0.3 |
0.25 |
0.03 |
0.08 |
0.015 |
- |
0.6–0.9 |
0.2–0.4 |
- |
- |
| Gr5Eli/Gr23 |
0.25 |
0.03 |
0.03 |
0.08 |
0.0125 |
- |
5.5–6.5 |
3.5–4.5 |
- |
- |
Ti: Balance
Application
Titanium Targets
Used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is a core material in integrated circuit production and usually requires >99.99% purity.
Aluminum Targets
Common in semiconductor and heat-resistant coating applications, also used in vehicles and electronics.
Copper Targets
Ideal for electrical conductivity applications such as electrodes, wiring, and films.
Tin Targets
Applied to enhance corrosion resistance of coated materials.
Zinc Targets
Used as corrosion barriers and in the production of cathodes, batteries, and paints.
Platinum, Silver, and Gold Targets
Precious metal sputtering targets offer chemical inertness and high conductivity for instrument and electrode applications.
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PVD Metal Sputtering Target 100x40mm Decoration And Tool Coating Images
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